Company Filing History:
4 out of 25,543 
3 out of 68 Years Active: 1994-1998
Title: David A. Vidusek: Innovator in Planarizing Technology
Introduction
David A. Vidusek is a notable inventor based in Camas, Washington, with a significant contribution to the field of planarizing technology. He holds four patents, showcasing his expertise and innovative spirit in the realm of photoresist layers and methods.
Latest Patents
One of his latest patents is focused on a silylated photo-resist layer and planarizing method. This technique involves several steps, including coating a substrate with a planarizing resist layer, softbaking it in the presence of a silicon-containing vapor or liquid, and then applying an imaging resist layer. The process continues with softbaking the imaging resist, selectively exposing it to light, developing the imaging resist layer, and etching the planarizing layer. The planarizing layer may consist of novolacs and other organic polymers commonly used in lithographic processes. Specifically, the polymer can be selected from novolac, polymethylmethacrylate, polyhydroxystyrene, and polydimethylglutarimide. Additionally, the invention includes a silylated planarizing resist that comprises a solution of a polymer and an acid, ensuring a homogeneous acid concentration on the substrate's surface.
Career Highlights
Throughout his career, David has worked with prominent companies such as Sharp Kabushiki Kaisha Corporation and Sharp Microelectronics Technology, Inc. His experience in these organizations has contributed to his development as an inventor and innovator in the technology sector.
Collaborations
David has collaborated with notable individuals in his field, including Tatsuo Nakato and Hiroki Tabuchi. These collaborations have likely enriched his work and expanded his innovative capabilities.
Conclusion
David A. Vidusek stands out as a significant figure in the field of planarizing technology, with a focus on enhancing photoresist layers and methods. His contributions through patents and collaborations reflect his dedication to innovation and advancement in technology.