This inventor holds 5 USPTO granted patents and 5 published patent applications and 1 EPO patent. Top assignees: Inanovate, Inc., Irresistible Materials, Ltd. Active years: 2012-2022.
Location History:
- Somerville, MA (US) (2012)
- Wellesley, MA (US) (2015 - 2022)
Company Filing History:
Years Active: 2012-2022
Title: David A Ure: Innovator in Photoresist Compositions
Introduction
David A Ure is a notable inventor based in Somerville, MA (US). He has made significant contributions to the field of photoresist compositions, holding a total of 5 patents. His work focuses on enhancing the resolution and effectiveness of photoresist materials used in various applications.
Latest Patents
One of Ure's latest patents is titled "Multiple trigger monomer containing photoresist compositions and method." This invention relates to novel negative working photoresist compositions that utilize multiple trigger monomers. The processes described involve the removal of acid-labile protecting groups from crosslinking functionalities in a first step, followed by crosslinking with an acid-sensitive crosslinker in a second step. This innovative approach increases the chemical gradient in areas receiving low doses of irradiation, effectively enhancing resolution and exposure latitude. Another significant patent is the "Longitudinal assay," which focuses on methods for detecting macro and small molecules, including bio-molecules, in liquid or gaseous samples.
Career Highlights
Throughout his career, David A Ure has worked with various companies, including Inanovate, Inc. and Irresistible Materials, Ltd. His expertise in photoresist technology has positioned him as a key figure in the development of advanced materials for fine pattern processing.
Collaborations
Ure has collaborated with notable individuals in his field, including James Curtis Nelson and Dongxu Yang. These partnerships have contributed to the advancement of his research and innovations.
Conclusion
David A Ure's contributions to the field of photoresist compositions demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of material science and its applications in technology.