Dave Krick

Title: The Innovative Contributions of Dave Krick

Introduction

Dave Krick is a notable inventor based in Port Matilda, Pennsylvania. He has made significant contributions to the field of cleaning systems, particularly with his innovative patent for a hot source cleaning system. His work has implications for various industries, including semiconductor manufacturing.

Latest Patents

Dave Krick holds a patent for a hot source cleaning system. This apparatus is designed for cleaning substrates mounted on a moveable platen. The system features a first chamber equipped with solvent-dispensing nozzles that wet the substrate surface with a solvent as the platen transports it. The platen moves in a predetermined direction and at a specific scan velocity, guiding the substrate into a process chamber. Within this chamber, a hot source provides heat energy directed toward the substrate surface, evaporating the solvent and effectively removing particulates from the substrate. This innovative cleaning method is particularly useful for precision photo-masks and wafers.

Career Highlights

Dave Krick is currently employed at NXP B.V., where he continues to develop and refine his innovative technologies. His work at NXP B.V. has allowed him to contribute to advancements in cleaning systems that are essential for maintaining high standards in manufacturing processes.

Collaborations

Throughout his career, Dave has collaborated with talented individuals such as Abbas Rastegar and Andy Ma. These collaborations have fostered an environment of innovation and creativity, leading to the development of cutting-edge technologies.

Conclusion

Dave Krick's contributions to the field of cleaning systems through his patented hot source cleaning system demonstrate his commitment to innovation. His work not only enhances manufacturing processes but also sets a standard for future developments in the industry.