The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 17, 2012
Filed:
Aug. 23, 2005
Abbas Rastegar, Schenectady, NY (US);
Andy MA, Fremont, CA (US);
Dave Krick, Port Matilda, PA (US);
Pat Marmillion, Austin, TX (US);
Abbas Rastegar, Schenectady, NY (US);
Andy Ma, Fremont, CA (US);
Dave Krick, Port Matilda, PA (US);
Pat Marmillion, Austin, TX (US);
NXP B.V., Eindhoven, NL;
Abstract
There is an apparatus for cleaning a substrate () mounted on a moveable platen. In an example embodiment, the apparatus comprises a first chamber (), the first chamber has solvent-dispensing nozzles (); the solvent-dispensing nozzles wet the substrate surface () with a solvent () as the platen transports the substrate. The platen moves in a predetermined direction and at a predetermined scan velocity as it transports the substrate into a process chamber. The process chamber has a hot source () at a predetermined height (h) from the substrate surface (); it provides heat energy directed toward the substrate surface, the heat energy evaporates the solvent () dispensed on the substrate surface; the solvent evaporation removes particulates () from the substrate surface, as the platen transports the substrate from the first chamber () into the process chamber. Substrates cleaned may include precision photo-masks, or wafers.