Andy Ma

Title: The Innovative Contributions of Andy Ma

Introduction

Andy Ma is a notable inventor based in Fremont, California. He has made significant contributions to the field of substrate cleaning technology. With one patent to his name, he has demonstrated his expertise and innovative thinking in this specialized area.

Latest Patents

Andy Ma's most recent patent is for a "Hot Source Cleaning System." This invention features an apparatus designed for cleaning a substrate mounted on a moveable platen. The system includes a first chamber equipped with solvent-dispensing nozzles that wet the substrate surface with a solvent as the platen transports the substrate. The platen moves in a predetermined direction and at a specific scan velocity, guiding the substrate into a process chamber. Within this chamber, a hot source is positioned at a predetermined height from the substrate surface, directing heat energy toward it. This heat energy evaporates the solvent, effectively removing particulates from the substrate surface during the transport process. The substrates that can be cleaned using this system include precision photo-masks and wafers.

Career Highlights

Andy Ma is currently employed at NXP B.V., where he continues to develop innovative solutions in the field of substrate cleaning. His work has been instrumental in advancing the technology used in this area, showcasing his commitment to innovation and excellence.

Collaborations

Throughout his career, Andy has collaborated with talented individuals such as Abbas Rastegar and Dave Krick. These partnerships have contributed to the development of cutting-edge technologies and have enhanced the impact of his work.

Conclusion

Andy Ma's contributions to the field of substrate cleaning technology exemplify his innovative spirit and dedication to advancing industry standards. His patent for the Hot Source Cleaning System is a testament to his expertise and commitment to improving cleaning processes for precision substrates.