Location History:
- Harve de Grace, MD (US) (2011)
- Havre de Grace, MD (US) (2012 - 2015)
Company Filing History:
4 out of 309 
1 out of 4,642 
Years Active: 2011-2015
Title: The Innovative Contributions of Darrell String
Introduction
Darrell String is a notable inventor based in Havre de Grace, Maryland. He has made significant contributions to the field of chemical mechanical polishing, holding a total of four patents. His work has advanced the technology used in various substrates, including magnetic, optical, and semiconductor materials.
Latest Patents
One of Darrell String's latest patents is a method of chemical mechanical polishing a substrate. This method includes providing a substrate and a chemical mechanical polishing pad with specific characteristics. The polishing pad features a composition that exhibits initial hydrolytic stability coupled with sustained hydrolytic instability. Additionally, it includes a rigid layer and a hot melt adhesive that bonds the polishing layer to the rigid layer. The method creates dynamic contact between the polishing surface and the substrate to effectively polish the surface.
Another significant patent is for a chemical mechanical polishing pad that has a window with an integral identification feature. This window allows for the identification of the polishing pad type through its observable features. The patent also includes a method for making these pads and using them to polish various substrates.
Career Highlights
Throughout his career, Darrell String has worked with several prominent companies in the industry. He has been associated with Rohm and Haas Electronic Materials, CMP Holdings, Inc., and Dow Global Technologies LLC. His experience in these organizations has contributed to his expertise in chemical mechanical polishing technologies.
Collaborations
Darrell has collaborated with notable coworkers, including Mary Jo Kulp and Ethan S. Simon. Their combined efforts have furthered advancements in the field of chemical mechanical polishing.
Conclusion
Darrell String's innovative work in chemical mechanical polishing has led to significant advancements in substrate technology. His patents reflect a deep understanding of the complexities involved in polishing processes. His contributions continue to influence the industry and pave the way for future innovations.