Darrell A Harris

Title: The Innovative Contributions of Darrell A. Harris

Introduction

Darrell A. Harris is a notable inventor based in Austin, TX, recognized for his significant contributions to the field of semiconductor technology. With a total of 2 patents, Harris has developed innovative solutions that enhance the efficiency and effectiveness of photolithography processes.

Latest Patents

Harris's latest patents include the "Adjustable Blade Reticle Assembly" and the "Exhaust Shroud and Skirt Apparatus and Method." The Adjustable Blade Reticle Assembly is designed to inhibit the image of a transparent, undesired feature on a reticle from printing on semiconductor material. This apparatus features a frame attachment connected to a pellicle frame, with a moveable opaque blade that can be positioned to prevent unwanted ultraviolet light from affecting the semiconductor material. The Exhaust Shroud and Skirt Apparatus focuses on removing particles and reducing temperature within equipment units, such as photolithography steppers, in a clean room environment. This innovative design includes a skirt and shroud that seal the equipment unit, allowing environmental gases to be effectively managed.

Career Highlights

Harris is currently employed at Advanced Micro Devices Corporation, where he continues to push the boundaries of semiconductor technology. His work has been instrumental in developing methods that improve the performance and reliability of photolithography equipment.

Collaborations

Throughout his career, Harris has collaborated with talented individuals such as Eric M. Apelgren and Gregg S. LeFevre. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Darrell A. Harris's contributions to the field of semiconductor technology through his patents and collaborative efforts highlight his role as a key innovator. His work continues to influence advancements in photolithography and semiconductor manufacturing processes.