Darong Oh

Title: Darong Oh - Innovator in Semiconductor Technology

Introduction

Darong Oh is an inventor based in Suwon-si, South Korea. He is known for his contributions to semiconductor technology, focusing on innovative designs and manufacturing methods. Although he currently holds no granted patents, his work in the field is noteworthy.

Latest Patent Applications

Darong Oh has submitted several patent applications that showcase his expertise in semiconductor devices. One of his latest applications describes a semiconductor device that includes a substrate with an insulating structure, a back-side metal layer, and a source/drain pattern. The design features a channel pattern connected to the source/drain pattern, with semiconductor patterns vertically stacked and spaced apart. Additionally, the gate electrode is positioned on the semiconductor patterns, and a back-side gate contact connects the back-side metal layer to the gate electrode. The application emphasizes the innovative arrangement of inner electrodes and the acute angle between the surfaces of the back-side gate contact.

Another application details a semiconductor device comprising a substrate with an active pattern, channel pattern, and source/drain pattern. The source/drain pattern is connected to the channel pattern, and the device includes a gate electrode, active contact, and a power delivery network layer. The design highlights the integration of a lower power interconnection line buried in the substrate, which enhances the device's functionality.

Conclusion

Darong Oh's work in semiconductor technology reflects his commitment to innovation and advancement in the field. His latest patent applications demonstrate his potential to contribute significantly to the industry in the future.