Taipei, Taiwan

Danny Chang

This inventor holds 1 USPTO granted patent. Top assignee: Synopsys, Inc.. Active years: 2023.


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: The Innovative Mind of Danny Chang

Introduction

Danny Chang is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of circuit layout verification. His work focuses on enhancing the efficiency and accuracy of verifying original layouts in electronic designs.

Latest Patents

Danny Chang holds a patent for a system, method, and computer-readable medium designed for verifying an original layout. This innovative patent includes a process for generating a reduced layout by trimming out cells below a top tier of the cell hierarchy and filtering out front-end-of-line (FEOL) layers. The method involves executing a text-based short check on the reduced layout, followed by the generation of an augmented reduced layout that includes pin information for cells in a second tier connected to the top tier. An interconnectivity check is then performed based on a schematic for the circuit, ultimately outputting results such as the location of shorts or connectivity mismatches. A conventional LVS check may also be executed to ensure thorough verification.

Career Highlights

Danny Chang is currently employed at Synopsys, Inc., a leading company in electronic design automation. His expertise in circuit layout verification has positioned him as a valuable asset within the organization.

Collaborations

Danny has collaborated with notable coworkers, including Mark Daniel Pogers and Jonathan Calvin White. Their combined efforts contribute to the advancement of technology in the field of electronic design.

Conclusion

Danny Chang's innovative work in circuit layout verification exemplifies the importance of precision in electronic design. His contributions continue to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
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