Santa Clara, CA, United States of America

Daniel William Howard


Average Co-Inventor Count = 2.4

ph-index = 2

Forward Citations = 141(Granted Patents)


Company Filing History:


Years Active: 2003-2006

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2 patents (USPTO):Explore Patents

Title: The Innovations of Daniel William Howard

Introduction

Daniel William Howard is a notable inventor based in Santa Clara, CA. He has made significant contributions to the field of network-based simulation tools, particularly in the area of mask defect printability analysis. With a total of 2 patents, Howard's work has facilitated advancements in user interface design and collaborative problem-solving.

Latest Patents

Howard's latest patents include a user interface for a networked-based mask defect printability analysis system. This innovative tool allows multiple users to access a mask simulation tool over a wide area network (WAN), enabling real-time collaboration and problem-solving. The user interface is designed to facilitate dialogue among users, featuring an enter box for messages and a talk box for capturing communications.

Another significant patent is the method and apparatus for a network-based mask defect printability analysis system. This system provides simulations and reports to clients over the Internet, allowing them to leverage the expertise of highly-trained engineers. The network-based simulation server simplifies access for clients, eliminating the need for expensive databases and enabling real-time comments and discussions on mask defect images.

Career Highlights

Throughout his career, Howard has worked with prominent companies such as Numerical Technologies, Inc. and Synopsys, Inc. His experience in these organizations has contributed to his expertise in developing advanced simulation tools.

Collaborations

Some of Howard's notable coworkers include Linyong Pang and Linard Karklin. Their collaboration has likely played a role in the development of innovative solutions in the field.

Conclusion

Daniel William Howard's contributions to the field of network-based simulation tools have made a significant impact on mask defect printability analysis. His innovative patents and collaborative efforts continue to advance the industry, showcasing the importance of effective user interfaces and real-time communication in problem-solving.

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