This inventor holds 1 USPTO granted patent and 3 published patent applications. Top assignees: Applied Materials, Inc., Wayne State University. Active years: 2026.
Company Filing History:
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Years Active: 2026
Title: The Innovations of Daniel Wei Ming Beh
Introduction
Daniel Wei Ming Beh is an accomplished inventor based in Detroit, MI. He has made significant contributions to the field of materials science, particularly in the area of thin film deposition. His innovative work has led to the development of methods that enhance the efficiency and effectiveness of material applications.
Latest Patents
Daniel holds a patent for "Atomic layer deposition of molybdenum silicide thin films." This patent describes methods for depositing molybdenum silicide films on a substrate. The process involves exposing the substrate to a molybdenum- and silicon-containing precursor along with a silane reactant to form the molybdenum silicide film. The exposures can be either sequential or simultaneous. The inherent deposition selectivity of this process can be achieved by adjusting various parameters, particularly temperature or precursor dose, to favor deposition on metal materials over dielectric materials. He has 1 patent to his name.
Career Highlights
Throughout his career, Daniel has worked with notable companies such as Applied Materials, Inc. and Wayne State University. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking research in thin film technologies.
Collaborations
Daniel has collaborated with esteemed colleagues, including Avgerinos V Gelatos and Jeffrey W Anthis. These partnerships have further enriched his work and expanded the impact of his innovations.
Conclusion
Daniel Wei Ming Beh is a prominent figure in the field of materials science, with a focus on thin film deposition techniques. His contributions continue to influence advancements in technology and materials engineering.