Daniel T K Pham

Title: The Innovative Contributions of Daniel T K Pham

Introduction

Daniel T K Pham is a notable inventor based in Austin, TX (US). He has made significant contributions to the field of semiconductor technology. His work has led to advancements that enhance the efficiency and effectiveness of semiconductor devices.

Latest Patents

Daniel T K Pham holds a patent for a process for forming a semiconductor device with thick and thin films. This innovative process involves several steps, including the formation of a first dielectric layer over a semiconductor device substrate. A resist layer is then patterned to expose portions of the first dielectric layer. Portions of the first dielectric layer are removed to reveal parts of the semiconductor device substrate. Following this, the resist layer is removed, and the semiconductor device substrate is cleaned without using a fluorine-containing solution. Finally, a second dielectric layer is formed over the semiconductor device substrate. This patent showcases his expertise in semiconductor fabrication.

Career Highlights

Daniel T K Pham is associated with Motorola Corporation, where he has contributed to various projects and innovations in semiconductor technology. His work at Motorola has positioned him as a key player in the industry, driving advancements that benefit the company and the broader technology landscape.

Collaborations

Throughout his career, Daniel has collaborated with talented individuals such as Ping Chen and Navakanta Bhat. These collaborations have fostered an environment of innovation and creativity, leading to the development of cutting-edge technologies.

Conclusion

Daniel T K Pham's contributions to semiconductor technology through his patent and work at Motorola Corporation highlight his role as an influential inventor. His innovative processes continue to shape the future of semiconductor devices.