Motorola Corporation

Daniel T K Pham

Ping Chen

Navakanta Bhat

Paul G Y Tsui

A first dielectric layer (,) is formed over a semiconductor device substrate. A resist layer (,) is then patterned to expose portions of the first dielectric layer (,). Portions of the first dielectric layer (,) are removed to expose portions of the semiconductor device substrate (,). The resist layer (,) is then removed. The semiconductor device substrate is cleaned without using a fluorine-containing solution and a second dielectric layer (,) is formed overlying the semiconductor device substrate.

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Austin, TX, United States of America

Daniel T K Pham