Location History:
- Glamorgan, GB (2015)
- Rhonda Cynon Taf, GB (2017)
- Newport, GB (2023)
Company Filing History:
Years Active: 2015-2023
Title: Innovations of Daniel T Archard
Introduction
Daniel T Archard is a notable inventor based in Rhonda Cynon Taf, GB. He has made significant contributions to the field of chemical vapor deposition technology. With a total of 3 patents to his name, Archard continues to push the boundaries of innovation in his industry.
Latest Patents
One of Archard's latest patents is for a PE-CVD apparatus and method. This invention features a capacitively coupled Plasma Enhanced Chemical Vapour Deposition (PE-CVD) apparatus that includes a chamber, a first electrode with a substrate support, a second electrode with a gas inlet structure, and an RF power source. The design allows for the introduction of a PE-CVD precursor gas mixture into the chamber through strategically placed precursor gas inlets. Another significant patent is also for a plasma-enhanced chemical vapor deposition (PE-CVD) apparatus. This apparatus includes a chamber with a circumferential pumping channel, a substrate support, and a plasma production device. The configuration of the upper and lower elements in the chamber is designed to confine the plasma effectively.
Career Highlights
Archard is currently employed at SPTS Technologies Limited, where he applies his expertise in developing advanced deposition technologies. His work has been instrumental in enhancing the efficiency and effectiveness of chemical vapor deposition processes.
Collaborations
Throughout his career, Archard has collaborated with notable colleagues, including Stephen Robert Burgess and Kathrine Crook. These partnerships have contributed to the advancement of innovative technologies in their field.
Conclusion
Daniel T Archard is a prominent inventor whose work in chemical vapor deposition technology has led to multiple patents and significant advancements in the industry. His contributions continue to shape the future of this technology.