Company Filing History:
Years Active: 2025
Title: The Innovative Contributions of Daniel Santos Rivera
Introduction
Daniel Santos Rivera is a notable inventor based in Albany, NY (US). He has made significant contributions to the field of semiconductor processing. His work focuses on enhancing the efficiency and precision of multi-patterning processes.
Latest Patents
Daniel holds a patent for a method titled "Double hardmasks for self-aligned multi-patterning processes." This innovative method involves processing a substrate by forming recesses in a first mask layer over a mask stack. The stack includes a lower hardmask, a middle mask, and an upper hardmask. The recesses define an initial pattern that includes a plurality of spacer structures, each with distinct sidewall heights. The process includes etching the upper hardmask selectively to the middle mask, transferring the initial pattern to the upper hardmask, and further etching the middle and lower hardmasks to achieve the desired pattern.
Career Highlights
Daniel is currently employed at Tokyo Electron Limited, a leading company in the semiconductor industry. His work there has been instrumental in advancing the technology used in semiconductor manufacturing. He has a total of 1 patent to his name, showcasing his innovative approach to solving complex engineering challenges.
Collaborations
Daniel collaborates with Eric Chih-Fang Liu, a fellow innovator in the field. Their partnership has led to advancements in semiconductor technologies and processes.
Conclusion
Daniel Santos Rivera's contributions to the field of semiconductor processing are noteworthy. His innovative patent and collaboration with industry professionals highlight his commitment to advancing technology. His work continues to influence the semiconductor industry positively.