Albuquerque, NM, United States of America

Daniel Robert Ward


Average Co-Inventor Count = 4.5

ph-index = 2

Forward Citations = 16(Granted Patents)


Location History:

  • San Clemente, CA (US) (2006)
  • Albuquerque, NM (US) (2019)
  • Calabasas, CA (US) (2022 - 2023)

Company Filing History:


Years Active: 2006-2023

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4 patents (USPTO):Explore Patents

Title: **Inventor Spotlight: Daniel Robert Ward from Albuquerque, NM**

Introduction

Daniel Robert Ward is an accomplished inventor based in Albuquerque, NM, known for his significant contributions to the field of advanced manufacturing. With a robust portfolio comprising four patents, Ward continues to push the boundaries of technology through innovative methods and processes.

Latest Patents

Ward's latest patents are centered around Atomic Precision Advanced Manufacturing (APAM). One notable patent is a **Method of Chemical Doping that Uses CMOS-Compatible Processes**. This method involves doping a substrate from a dopant precursor gas while ensuring compatibility with CMOS processes. It entails covering the substrate surface with a hard mask, selectively removing material, and exposing specific areas to the dopant precursor gas. The substrate is then heated to facilitate the incorporation of dopants into the substrate surface.

Another of his significant inventions is the **Photolithography of Atomic Layer Resist**. This innovative method allows for the selective depassivation of an atomic or molecular resist layer on a substrate by utilizing an optical beam. The process ejects adsorbed atoms or molecules from the substrate surface and further incorporates dopants from precursor gases, thus enhancing the substrate's functionalities.

Career Highlights

Daniel Robert Ward is currently employed at National Technology & Engineering Solutions of Sandia, LLC, where he applies his extensive knowledge in advanced manufacturing. His work has not only earned him multiple patents but also positioned him as a thought leader in the domain of chemical doping and photolithography, showcasing his ability to combine theoretical knowledge with practical applications.

Collaborations

Ward has collaborated with distinguished coworkers, including Andrew David Baczewski and Shashank Misra. Together, they explore innovative solutions and techniques that advance the field, contributing to project developments at Sandia National Laboratories.

Conclusion

In summary, Daniel Robert Ward represents the spirit of innovation in Albuquerque, NM. Through his groundbreaking patents and career at Sandia National Laboratories, he exemplifies how inventors can impact technology and manufacturing processes. With ongoing research and collaboration, Ward's work promises to influence future advancements in Atomic Precision Advanced Manufacturing.

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