The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 24, 2023
Filed:
Jun. 28, 2021
National Technology & Engineering Solutions of Sandia, Llc, Albuquerque, NM (US);
Shashank Misra, Albuquerque, NM (US);
Daniel Robert Ward, Calabasas, CA (US);
DeAnna Marie Campbell, Albuquerque, NM (US);
Tzu-Ming Lu, Albuquerque, NM (US);
Scott William Schmucker, Albuquerque, NM (US);
Evan Michael Anderson, Albuquerque, NM (US);
Andrew Jay Leenheer, Albuquerque, NM (US);
Jeffrey Andrew Ivie, Albuquerque, NM (US);
National Technology & Engineering Solutions of Sandia, LLC, Albuquerque, NM (US);
Abstract
A method of Atomic Precision Advanced Manufacturing (APAM) is provided, in which a substrate is doped from a dopant precursor gas. The method involves covering a surface of the substrate with a hard mask, selectively removing material from the hard mask such that selected areas of the substrate surface are laid bare, exposing the laid-bare areas to the dopant precursor gas, and heating the substrate so as to incorporate dopant from the dopant precursor gas into the substrate surface.