The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 23, 2022

Filed:

Feb. 23, 2021
Applicant:

National Technology & Engineering Solutions of Sandia, Llc, Albuquerque, NM (US);

Inventors:

Aaron Michael Katzenmeyer, Albuquerque, NM (US);

Shashank Misra, Albuquerque, NM (US);

Andrew David Baczewski, Albuquerque, NM (US);

Evan Michael Anderson, Albuquerque, NM (US);

George T. Wang, Albuquerque, NM (US);

Daniel Robert Ward, Calabasas, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/428 (2006.01); H01L 21/3065 (2006.01); H01L 21/306 (2006.01); H01L 21/02 (2006.01); B82Y 40/00 (2011.01);
U.S. Cl.
CPC ...
H01L 21/428 (2013.01); B82Y 40/00 (2013.01); H01L 21/02532 (2013.01); H01L 21/30604 (2013.01); H01L 21/30655 (2013.01);
Abstract

In a method of atomic precision advanced manufacturing (APAM), an atomic or molecular resist layer on a substrate surface is selectively depassivated by locally exciting the substrate surface with an optical beam effective to eject adsorbed atoms or molecules from the substrate surface. The substrate surface is further processed by exposing it to a precursor gas, decomposing the precursor gas to release a dopant, and incorporating the dopant into the substrate surface.


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