Company Filing History:
Years Active: 2018-2019
Title: The Innovative Contributions of Daniel Lenz
Introduction
Daniel Lenz is a notable inventor based in Aalen, Germany. He has made significant contributions to the field of illumination technology, particularly in projection exposure apparatuses. With a total of 2 patents, Lenz has demonstrated his expertise and innovative spirit in his work.
Latest Patents
Lenz's latest patents include a method for adjusting a lighting setting and an illumination optical unit for EUV projection lithography. The first patent describes a method for setting an illumination setting for illuminating an object field of a projection exposure apparatus. This method takes into account the sensitivity of a performance variable for changes in the intensity of the illumination radiation in the illumination pupil. The second patent focuses on an illumination optical unit for EUV projection lithography, which includes a field facet mirror and a pupil facet mirror. This unit features a correction control device that allows for the controlled displacement of field facets, ensuring that the illumination light partial beam is effectively managed.
Career Highlights
Daniel Lenz is currently employed at Carl Zeiss SMT GmbH, a leading company in the field of optical systems and lithography. His work at this esteemed organization has allowed him to further develop his innovative ideas and contribute to advancements in technology.
Collaborations
Lenz has collaborated with notable colleagues such as Alexander Winkler and Thomas Fischer. These partnerships have likely enriched his work and fostered a collaborative environment for innovation.
Conclusion
Daniel Lenz's contributions to the field of illumination technology are noteworthy. His patents reflect a deep understanding of the complexities involved in projection exposure apparatuses. Through his work at Carl Zeiss SMT GmbH, Lenz continues to push the boundaries of innovation in his field.