Carl Zeiss Smt Gmbh

Daniel Lenz

Alexander Winkler

Thomas Fischer

A method for setting an illumination setting for illuminating an object field of a projection exposure apparatus includes taking into account the sensitivity of a performance variable for changes in the intensity of the illumination radiation in the illumination pupil.

Method for adjusting a lighting setting

An illumination optical unit for EUV projection lithography includes a field facet mirror and a pupil facet mirror. A correction control device, which is used for the controlled displacement of at least some field facets that are usable as correction field facets, which are signal connected to displacement actuators, is embodied so that a correction displacement path for the correction field facets is so large that a respective correction illumination channel is cut off at the margin by the correction pupil facet so that the illumination light partial beam is not transferred in the entirety thereof from the correction pupil facet into the object field.

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Aalen, Germany

Daniel Lenz