Company Filing History:
Years Active: 1992-2025
Title: The Innovative Contributions of Daniel L. Durado
Introduction
Daniel L. Durado is a notable inventor based in Kalispell, MT (US). He has made significant contributions to the field of semiconductor processing, holding a total of 9 patents. His work focuses on improving electroplating systems and methods, which are crucial for the manufacturing of semiconductor devices.
Latest Patents
Among his latest patents, Durado has developed an "Electroplating Wetting Chamber with Reduced Bubble Entrapment." This invention provides methods and systems for cleaning and wetting a semiconductor substrate. The technology involves creating an atmosphere in a basin that houses the semiconductor substrate, utilizing a gas with higher solubility in a wetting agent than oxygen. Additionally, he has designed systems that include spraying the wetting agent onto the substrate while maintaining the specific atmosphere. His innovations also encompass rotationally translating the semiconductor substrate or the spray head, ensuring effective wetting of multiple features defined in the substrate.
Another significant patent is related to "Plating Systems Having Reduced Air Entrainment." This technology features a recirculating tank that contains a processing fluid and is fluidly coupled with a delivery pump. The design includes a vessel with an inner and outer chamber, where the inner chamber holds a smaller volume of processing fluid. A liquid level sensor is integrated to provide indications of fluid levels, enhancing the efficiency of the electroplating process.
Career Highlights
Durado has worked with prominent companies in the semiconductor industry, including Semitool, Inc. and Applied Materials, Inc. His experience in these organizations has allowed him to refine his skills and contribute to advancements in semiconductor manufacturing technologies.
Collaborations
Throughout his career, Durado has collaborated with notable colleagues such as Raymon F. Thompson and Robert W. Gordon. These partnerships have fostered innovation and the development of cutting-edge technologies in the field.
Conclusion
Daniel L. Durado's contributions to semiconductor processing through his patents and collaborations highlight his role as a significant inventor in the industry. His work continues to influence the efficiency and effectiveness of electroplating systems, showcasing the importance of innovation in technology.