Aalen, Germany

Daniel Krähmer


Average Co-Inventor Count = 4.3

ph-index = 2

Forward Citations = 46(Granted Patents)


Company Filing History:


Years Active: 2005-2008

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6 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Daniel Krähmer

Introduction

Daniel Krähmer is a notable inventor based in Aalen, Germany. He has made significant contributions to the field of optics, particularly in microlithography projection systems. With a total of 6 patents to his name, Krähmer's work has had a profound impact on image quality in optical systems.

Latest Patents

One of Krähmer's latest patents involves an objective with fluoride crystal lenses. This innovative design aims to reduce the effects of birefringence, which can negatively affect image quality. The lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. When utilizing two or more fluoride crystal lenses, their axes are oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they are positioned at rotated angles relative to each other. Furthermore, the birefringence-related effects are minimized by employing groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. An additional improvement is achieved by applying a compensation coating to at least one optical element of the objective.

Career Highlights

Krähmer is currently employed at Carl Zeiss SMT AG, a leading company in the field of optical systems. His work at this esteemed organization has allowed him to further develop his innovative ideas and contribute to cutting-edge technologies in optics.

Collaborations

Throughout his career, Krähmer has collaborated with talented individuals such as Michael Gerhard and Toralf Gruner. These partnerships have fostered a creative environment that has led to the development of groundbreaking optical solutions.

Conclusion

Daniel Krähmer's contributions to the field of optics, particularly through his innovative patents, have significantly advanced the technology used in microlithography projection systems. His work continues to influence the industry and improve image quality in optical applications.

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