The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 31, 2006
Filed:
Dec. 24, 2003
Applicants:
Daniel Krähmer, Aalen, DE;
Eric Eva, Aalen, DE;
Inventors:
Daniel Krähmer, Aalen, DE;
Eric Eva, Aalen, DE;
Assignee:
Carl Zeiss SMT AG, Oberkochen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/42 (2006.01);
U.S. Cl.
CPC ...
Abstract
Radiation-induced damage to a lens material in a projection exposure system is reduced by selection of maximum design fluence values Hfor lenses and at least one lens made of a material having a characteristic transition point Tafter exposure to a given amount of radiation, wherein, for instance, T<0.8. Hamong other relationships and/or characteristics of the lenses.