Company Filing History:
Years Active: 2025
Title: The Innovative Contributions of Daniel J. Schinke
Introduction
Daniel J. Schinke is a notable inventor based in Portland, Oregon. He has made significant contributions to the field of integrated circuits, showcasing his expertise through his innovative patent. Schinke's work is characterized by a focus on enhancing the functionality and efficiency of electronic components.
Latest Patents
One of Schinke's key patents is titled "Hybrid etch stop layers." This patent describes an integrated circuit that includes a first layer and a second layer positioned above the first layer. A third layer is situated between a first section of the first layer and a first section of the second layer. Additionally, a fourth layer is laterally adjacent to the third layer, positioned between a second section of the first layer and a second section of the second layer. Notably, the first dielectric material of the third layer differs from the second dielectric material of the fourth layer, either compositionally or structurally. In this design, the third and fourth layers serve as etch stop layers, which can be coplanar with respect to their top surfaces, bottom surfaces, or both.
Career Highlights
Daniel J. Schinke is currently employed at Intel Corporation, a leading technology company known for its advancements in semiconductor manufacturing. His role at Intel has allowed him to contribute to cutting-edge research and development in the field of electronics. Schinke's innovative approach has positioned him as a valuable asset within the company.
Collaborations
Throughout his career, Schinke has collaborated with talented individuals such as Deepyanti Taneja and Travis W. LaJoie. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.
Conclusion
Daniel J. Schinke's contributions to the field of integrated circuits through his patent on hybrid etch stop layers exemplify his innovative spirit and dedication to advancing technology. His work at Intel Corporation and collaborations with fellow inventors further highlight his impact on the industry.
