Daniel Heim

Title: The Innovative Contributions of Daniel Heim

Introduction

Daniel Heim is a notable inventor based in Wels, Austria. He has made significant contributions to the field of plasma coating technology. His innovative approach has led to the development of a unique method for coating substrates, particularly press platens.

Latest Patents

Daniel Heim holds a patent for a "Method for the plasma coating of a substrate, in particular a press platen." This patent describes an apparatus designed for plasma coating, which includes a vacuum chamber and a segmented electrode. Each segment of the electrode is connected to a dedicated electrical source. The method involves positioning a substrate opposite the electrode and activating at least one energy source assigned to an electrode segment. Additionally, a gas is introduced to facilitate plasma-enhanced chemical vapor deposition on the substrate.

Career Highlights

Throughout his career, Daniel Heim has worked with Berndorf Hueck Band- und Pressblechtechnik GmbH, a company known for its expertise in press technology. His work has focused on advancing the capabilities of plasma coating processes, which are essential in various industrial applications.

Collaborations

Daniel has collaborated with notable professionals in his field, including Andreas Gebeshuber and Johann Laimer. These collaborations have contributed to the advancement of plasma coating technologies and have fostered innovation in the industry.

Conclusion

Daniel Heim's contributions to plasma coating technology exemplify the spirit of innovation. His patent and career achievements highlight the importance of advancements in industrial processes. His work continues to influence the field and inspire future developments.