The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 27, 2016

Filed:

Aug. 06, 2013
Applicant:

Berndorf Hueck Band- Und Pressblechtechnik Gmbh, Berndorf, AT;

Inventors:

Andreas Gebeshuber, Neuzeug, AT;

Daniel Heim, Wels, AT;

Johann Laimer, Baden, AT;

Thomas Mueller, Gunskirchen, AT;

Michael Proschek, Schoenau, AT;

Otto Stadler, Hernstein, AT;

Herbert Stoeri, Wiener Neustadt, AT;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/50 (2006.01); H05H 1/24 (2006.01); H01J 37/32 (2006.01); C23C 16/52 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32532 (2013.01); C23C 16/50 (2013.01); C23C 16/52 (2013.01); H01J 37/32577 (2013.01);
Abstract

An apparatus for the plasma coating of a substrate, in particular a press platen, is provided and is used to perform a method to plasma coat the press platen. The apparatus includes a vacuum chamber and, arranged therein, an electrode, which is segmented. Each of the electrode segments has a dedicated connection for an electrical source. Also provided is the method for operating the apparatus. According to the method, a substrate to be coated is positioned opposite the electrode and at least one energy source that is assigned to an electrode segment is activated. Moreover, a gas is introduced, with the effect of bringing about plasma-enhanced chemical vapor deposition on the substrate.


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