Daniel Glöß

Title: The Innovations of Daniel Glöß

Introduction

Daniel Glöß is a notable inventor based in Dresden, Germany. He has made significant contributions to the field of materials science, particularly in the development of piezoelectric films. His innovative methods have the potential to impact various technological applications.

Latest Patents

Daniel Glöß holds a patent for a "Method for depositing a piezoelectric film containing AlN." This method involves depositing a piezoelectric film on a substrate using magnetron sputtering with at least two targets, one of which contains aluminum. The process occurs within a vacuum chamber where a mixture of gases, including reactive nitrogen and an inert gas, is introduced. During the sputtering process, both unipolar and bipolar pulse modes are alternately utilized. The resulting film contains AlN of the formula AlNO, with specific ranges for its components.

Career Highlights

Throughout his career, Daniel Glöß has worked with prestigious organizations such as the Fraunhofer Society for the Advancement of Applied Research and Technische Universität Dresden. His work in these institutions has allowed him to refine his expertise and contribute to cutting-edge research in his field.

Collaborations

Daniel has collaborated with notable colleagues, including Hagen Bartzsch and Peter Frach. These partnerships have fostered a collaborative environment that enhances innovation and research outcomes.

Conclusion

Daniel Glöß is a prominent figure in the field of piezoelectric film technology. His innovative methods and collaborations have positioned him as a key contributor to advancements in materials science. His work continues to inspire future innovations in the industry.