This inventor holds 2 USPTO granted patents, plus 1 CIPO patent. Top assignee: Luxtron Corporation. Active years: 1994-2000.
Company Filing History:
Years Active: 1994-2000
Title: The Innovations of Daniel E. Glenn
Introduction
Daniel E. Glenn is a notable inventor based in Mountain View, CA (US). He has made significant contributions to the field of semiconductor processing and has been awarded 2 patents for his innovative techniques. His work focuses on improving the efficiency and effectiveness of processes used in integrated circuit manufacturing.
Latest Patents
One of his latest patents is titled "In situ technique for monitoring and controlling a process of." This invention involves an apparatus designed to remove material from an article, such as an exposed surface of an intermediate integrated circuit structure. The apparatus utilizes a sensor that is mechanically coupled to a moving carrier of the article. It directs an electromagnetic radiation beam through the article to its first side, where the structure is substantially transparent. The beam is detected after interacting with the article, providing information about the state of the processing of the exposed surface. This information is transmitted from the moving carrier to a stationary receiver without the use of physical transmission media, such as wires or optical fibers. Multiple sensors mounted on the moving article carrier enhance the information regarding the uniformity of the processing across the exposed surface.
Another significant patent by Glenn is the "Processing endpoint detecting technique and detector structure using." This invention provides a non-contact monitoring technique for processes performed on surfaces, particularly in semiconductor wafer integrated circuit processing and flat panel display substrate processing. The detector structure includes multiple small area radiation sources, such as light-emitting diodes, arranged symmetrically around a large area photodetector. This configuration ensures that the amount of source radiation reflected onto the detector is minimally affected by any wobble or tilting of the surface during processing.
Career Highlights
Daniel E. Glenn is currently associated with Luxtron Corporation, where he continues to innovate in the field of semiconductor technology. His work has been instrumental in advancing the methods used in the industry, contributing to more efficient manufacturing processes.
Collaborations
Throughout his career, Glenn has collaborated with notable colleagues, including Mei H. Sun and Herbert E. Litvak. These collaborations have further enriched his work and have led to advancements in the technologies he has developed.
Conclusion
Daniel E. Glenn's contributions to the field of semiconductor processing through his innovative patents demonstrate his commitment to advancing technology. His work continues to influence the industry, making significant strides in the efficiency of integrated circuit manufacturing.