Raleigh, NC, United States of America

Daniel Cronin

This inventor holds 1 USPTO granted patent. Top assignee: Cree Gmbh. Active years: 2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Daniel Cronin. Retrieved from https://idiyas.com/inventor/daniel-cronin

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 2009

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Daniel Cronin

Introduction

Daniel Cronin is an accomplished inventor based in Raleigh, NC (US). He has made significant contributions to the field of semiconductor technology. His work focuses on enhancing the efficiency and effectiveness of vacuum processing systems.

Latest Patents

Daniel holds a patent for a "Heat sink assembly and related methods for semiconductor vacuum processing systems." This innovative assembly supports a substrate during vacuum processing operations. It features a thermally conductive heat sink tray with at least one wafer pocket and a heat sink carrier that enhances thermal management.

Career Highlights

Daniel Cronin is currently employed at Cree GmbH, a company known for its advancements in semiconductor technology. His expertise in thermal management systems has positioned him as a valuable asset in the industry. With a focus on innovation, he continues to contribute to the development of cutting-edge technologies.

Collaborations

Daniel has collaborated with notable colleagues, including Van Mieczowski and Winston T Parker. These partnerships have fostered a creative environment that encourages the exchange of ideas and advancements in technology.

Conclusion

Daniel Cronin's contributions to semiconductor technology through his innovative patents and collaborations highlight his role as a key figure in the industry. His work continues to influence advancements in vacuum processing systems.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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