Daniel Cook

Title: The Innovative Contributions of Daniel Cook

Introduction

Daniel Cook is a notable inventor based in Newport, GB. He has made significant contributions to the field of material deposition technology, holding two patents that showcase his innovative approach to engineering.

Latest Patents

Daniel's latest patents include a method and apparatus for depositing a dielectric material onto a substrate using pulsed DC magnetron sputtering. This method involves a pulsed DC magnetron device that generates one or more primary magnetic fields. The process allows for sputtering material from a target, with the target and substrate separated by a gap ranging from 2.5 to 10 cm. Additionally, a secondary magnetic field is produced within the chamber, causing the plasma generated by the pulsed DC magnetron device to expand towards the chamber walls.

Career Highlights

Throughout his career, Daniel has worked with various companies, including SPTS Technologies Limited. His work has focused on advancing technologies related to material deposition, which has applications in various industries.

Collaborations

Daniel has collaborated with several professionals in his field, including Rhonda Hyndman and Amit Rastogi. These collaborations have contributed to the development and refinement of his innovative methods.

Conclusion

Daniel Cook's contributions to the field of material deposition through his patents and collaborations highlight his role as a significant inventor. His work continues to influence advancements in technology and engineering.