Company Filing History:
Years Active: 2018-2021
Title: The Innovative Contributions of Daniel Claessens
Introduction
Daniel Claessens is a notable inventor based in Aachen, Germany. He has made significant contributions to the field of chemical vapor deposition (CVD) technology. With a total of 3 patents to his name, Claessens continues to push the boundaries of innovation in his industry.
Latest Patents
One of Claessens' latest patents is a susceptor for a chemical vapor deposition reactor. This invention includes insertion openings arranged in a bearing surface of the susceptor. An insertion section of a positioning element is inserted into one of the insertion openings, forming positioning flanks that fix the position of a substrate. The design features side walls and a base, with specific distances separating various components to enhance functionality.
Another significant patent involves methods for controlling substrate temperature using a variety of flushing gases. In this innovation, flushing gases with different heat conductivities are utilized to manage the temperature between a substrate holder and a heating system. The configuration of the substrate holder is designed to optimize heat transmission, ensuring efficient operation in both central and circumferential regions.
Career Highlights
Daniel Claessens is currently employed at Aixtron SE, a leading company in the field of CVD technology. His work at Aixtron has allowed him to develop and refine his innovative ideas, contributing to advancements in the industry.
Collaborations
Claessens has collaborated with talented coworkers such as Adam Boyd and Eduardo Osman Piniero Sufan. These partnerships have fostered a creative environment that encourages the exchange of ideas and expertise.
Conclusion
Daniel Claessens exemplifies the spirit of innovation in the field of chemical vapor deposition technology. His patents and contributions continue to influence the industry, showcasing his commitment to advancing technology.