The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 07, 2020

Filed:

Apr. 03, 2018
Applicant:

Aixtron SE, Herzogenrath, DE;

Inventors:

Adam Boyd, Kelmis, DE;

Daniel Claessens, Aachen, DE;

Hugo Silva, Aachen, DE;

Assignee:

AIXTRON SE, Herzogenrath, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/46 (2006.01); C23C 16/458 (2006.01); H01L 21/687 (2006.01); H01L 21/67 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
C23C 16/458 (2013.01); C23C 16/455 (2013.01); C23C 16/46 (2013.01); H01L 21/67109 (2013.01); H01L 21/6875 (2013.01); H01L 21/68735 (2013.01); H01L 21/68771 (2013.01);
Abstract

In a CVD reactor, flushing gases of different heat conductivities are used to flush a gap between a substrate holder and a heating system. The lower side of the substrate holder is configured differently in a central region with respect to the heat transmission from the heating system to the substrate holder, than in a circumferential region that surrounds the central region. The gap has such a gap height that, upon a change of a first flushing gas with a first heat conductivity to a second flushing gas with a second heat conductivity, the heat supplied from the heating system to the substrate holder changes differently in the circumferential region than in the central region.


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