Daniel C Sutryn

Title: The Innovations of Daniel C Sutryn

Introduction

Daniel C Sutryn is an accomplished inventor based in Wyomissing Hills, PA (US). He holds a total of 3 patents that showcase his expertise in semiconductor technology. His contributions to the field have significantly advanced the methods of fabricating semiconductor devices.

Latest Patents

One of his notable patents is the "Method of fabricating a semiconductor mesa device." This invention involves a method of fabricating a semiconductor device by selectively etching at least a first semiconductor layer on a semiconductor wafer. The process includes performing a lateral taper etch in the layer, forming a second layer over the etched region to planarize it, and subsequently performing a second etch to create a mesa geometry. This innovative approach allows for device fabrication with a lateral taper, which is beneficial for the monolithic integration of devices, such as expanded beam lasers, while minimizing unwanted increases in mesa width, known as mesa bulge.

Another significant patent is the "MOCVD method and apparatus." In this invention, gases are channeled around the periphery of a baffle plate in an MOCVD reactor. The gases flow radially inward along a slotted injection plate, where the slots are of non-uniform width to compensate for a non-uniform rate of deposition. This design results in a more uniform deposit of epitaxially grown material over a rotating heated substrate.

Career Highlights

Throughout his career, Daniel has worked with prestigious organizations such as AT&T Bell Laboratories and Agere Systems. His experience in these companies has allowed him to refine his skills and contribute to groundbreaking advancements in semiconductor technology.

Collaborations

Daniel has collaborated with notable professionals in the field, including Jerome Levkoff and John W Benko. These collaborations have further enriched his work and expanded the impact of his inventions.

Conclusion

Daniel C Sutryn's innovative patents and career achievements highlight his significant contributions to semiconductor technology. His work continues to influence the industry and pave the way for future advancements.