This inventor holds 3 USPTO granted patents. Top assignees: Shell Oil Comapny, Technische Universiteit. Active years: 1990-2007.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1990-2007
Title: The Innovative Contributions of Daniel C. Schram
Introduction
Daniel C. Schram is a notable inventor based in Eindhoven, Netherlands. He has made significant contributions to the field of materials science, particularly in the deposition of silicon layers and plasma surface treatment. With a total of 3 patents to his name, Schram's work has implications for various technological applications.
Latest Patents
One of Schram's latest patents is titled "Process and device for the deposition of an at least partially crystalline silicon layer on a substrate." This innovative process involves generating plasma and exposing a substrate to a silicon-containing source fluid for deposition. A pressure drop is applied between the source fluid supply and the substrate, while an auxiliary fluid is injected to etch non-crystalline silicon atoms.
Another significant patent is the "Method for plasma surface treating and preparation of membrane layers." This process utilizes an apparatus designed for plasma surface treatment, which operates at atmospheric pressure and communicates with a lower pressure plasma treating section. A plasma beam containing fluid reactants impinges on the substrate surface to form a membrane layer, showcasing Schram's expertise in advanced material processing.
Career Highlights
Throughout his career, Daniel C. Schram has worked with prominent organizations, including Shell Oil Company and Technische Universiteit. His experience in these institutions has allowed him to refine his skills and contribute to groundbreaking research in his field.
Collaborations
Schram has collaborated with notable colleagues such as Hubertus J. Schuurmans and Jan Werner. These partnerships have fostered an environment of innovation and have led to the development of advanced technologies in materials science.
Conclusion
Daniel C. Schram's contributions to the field of materials science through his patents and collaborations highlight his role as a significant inventor. His work continues to influence advancements in technology and materials processing.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile