Eindhoven, Netherlands

Daniel C Schram


Average Co-Inventor Count = 4.0

ph-index = 2

Forward Citations = 49(Granted Patents)


Company Filing History:


Years Active: 1990-2007

Loading Chart...
3 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Daniel C. Schram

Introduction

Daniel C. Schram is a notable inventor based in Eindhoven, Netherlands. He has made significant contributions to the field of materials science, particularly in the deposition of silicon layers and plasma surface treatment. With a total of 3 patents to his name, Schram's work has implications for various technological applications.

Latest Patents

One of Schram's latest patents is titled "Process and device for the deposition of an at least partially crystalline silicon layer on a substrate." This innovative process involves generating plasma and exposing a substrate to a silicon-containing source fluid for deposition. A pressure drop is applied between the source fluid supply and the substrate, while an auxiliary fluid is injected to etch non-crystalline silicon atoms.

Another significant patent is the "Method for plasma surface treating and preparation of membrane layers." This process utilizes an apparatus designed for plasma surface treatment, which operates at atmospheric pressure and communicates with a lower pressure plasma treating section. A plasma beam containing fluid reactants impinges on the substrate surface to form a membrane layer, showcasing Schram's expertise in advanced material processing.

Career Highlights

Throughout his career, Daniel C. Schram has worked with prominent organizations, including Shell Oil Company and Technische Universiteit. His experience in these institutions has allowed him to refine his skills and contribute to groundbreaking research in his field.

Collaborations

Schram has collaborated with notable colleagues such as Hubertus J. Schuurmans and Jan Werner. These partnerships have fostered an environment of innovation and have led to the development of advanced technologies in materials science.

Conclusion

Daniel C. Schram's contributions to the field of materials science through his patents and collaborations highlight his role as a significant inventor. His work continues to influence advancements in technology and materials processing.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…