Ithaca, NY, United States of America

Daniel C Ralph

USPTO Granted Patents = 12 

Average Co-Inventor Count = 3.8

ph-index = 6

Forward Citations = 180(Granted Patents)


Company Filing History:


Years Active: 2015-2021

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12 patents (USPTO):Explore Patents

Title: Innovations by Inventor Daniel C Ralph

Introduction

Daniel C Ralph is a prolific inventor based in Ithaca, NY, with a remarkable portfolio consisting of 12 patents. His innovative work primarily focuses on cutting-edge technologies related to two-dimensional materials and spintronic devices. Ralph's contributions to the field are significant, showcasing advancements that can impact various applications in electronics and materials science.

Latest Patents

Ralph's latest patents highlight his expertise and creativity in the realms of nanotechnology and semiconductor devices. One of his notable inventions is an apparatus featuring atomically-thin ohmic edge contacts between two-dimensional materials. This innovation includes methods for making these apparatuses and devices that utilize them, involving a substrate, a monolayer graphene film, and a single-layer transition metal dichalcogenide. This design ensures a one-dimensional ohmic edge contact for enhanced performance in electronic devices.

Additionally, he has developed circuits and devices based on the enhanced spin Hall effect for efficient spin transfer torque applications. This patent emphasizes the utilization of a spin Hall effect metal layer coupled with a magnetic free layer, which can significantly improve the strength of the spin transfer torque effect through various engineering techniques.

Career Highlights

Daniel C Ralph is associated with Cornell University, where he contributes his knowledge and experience to the academic community. His career is marked by a strong focus on research and innovation, driving forward the understanding and application of advanced materials in technology.

Collaborations

Throughout his career, Ralph has collaborated with prominent experts in his field. Notable coworkers include Robert A. Buhrman and Chi-feng Pai, with whom he has engaged in several innovative projects. These collaborations have further enriched his research endeavors and contributed to the development of groundbreaking technologies.

Conclusion

In conclusion, Daniel C Ralph stands out as a significant figure in the field of material science and engineering. With 12 patents to his name, his work paves the way for future innovations, particularly in the realm of two-dimensional materials and spintronic devices. His contributions at Cornell University and collaborations with esteemed colleagues ensure that his impact on the technology landscape will continue to grow.

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