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For the Inventor, By the Inventor

Jericho, VT, United States of America

Daniel C Cole

USPTO Granted Patents = 14

Average Co-Inventor Count = 4.1

ph-index = 7

Forward Citations = 375(Granted Patents)


Company Filing History:

goldMedal14 out of 164,275 
 
International Business Machines Corporation
 patents

Years Active: 2001-2004

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14 patents (USPTO):Explore Patents
1. 6704695 - Interactive optical proximity correction design method (2004-03-09),
2. 6667136 - Method to control nested to isolated line printing (2003-12-23),
3. 6458493 - Method to control nested to isolated line printing (2002-10-01),
4. 6430733 - Contextual based groundrule compensation method of mask data set generation (2002-08-06),
5. 6429469 - Optical Proximity Correction Structures Having Decoupling Capacitors (2002-08-06),
6. 6425112 - Auto correction of error checked simulated printed images (2002-07-23),
7. 6387596 - Method of forming resist images by periodic pattern removal (2002-05-14),
8. 6383719 - Process for enhanced lithographic imaging (2002-05-07),
9. 6373975 - Error checking of simulated printed images with process window effects included (2002-04-16),
10. 6268908 - Micro adjustable illumination aperture (2001-07-31),
11. 6261724 - Method of modifying a microchip layout data set to generate a predicted mask printed data set (2001-07-17),
12. 6258490 - Transmission control mask utilized to reduce foreshortening effects (2001-07-10),
13. 6238850 - Method of forming sharp corners in a photoresist layer (2001-05-29),
14. 6214494 - Serif mask design methodology based on enhancing high spatial frequency contribution for improved printability (2001-04-10),

Title: The Innovative Contributions of Daniel C. Cole

Introduction

Daniel C. Cole is a prominent inventor based in Jericho, Vermont, known for his significant contributions to the field of optical proximity correction. With a total of 14 patents to his name, Cole has made remarkable advancements in photomask design and lithography processes. His work is instrumental in enhancing the precision and efficiency of semiconductor manufacturing.

Latest Patents

Cole's latest patents showcase his innovative approach to solving complex challenges in the industry. One of his notable inventions is the "Interactive Optical Proximity Correction Design Method." This method involves creating a photomask data set by inputting a design data set and applying a lithography simulation model. The process includes merging design levels with simulated printed data, applying tests, and correcting the design until it meets the required standards. Another significant patent is the "Method to Control Nested to Isolated Line Printing." This invention focuses on a photomask structure that optimizes light transmission for improved pattern transfer to photosensitive layers.

Career Highlights

Daniel C. Cole is currently employed at International Business Machines Corporation (IBM), where he continues to push the boundaries of innovation in his field. His expertise in optical proximity correction has positioned him as a key player in the development of advanced lithography techniques.

Collaborations

Throughout his career, Cole has collaborated with esteemed colleagues such as Edward W. Conrad and Orest Bula. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Daniel C. Cole's contributions to the field of optical proximity correction and photomask design have significantly impacted the semiconductor industry. His innovative patents and collaborative efforts exemplify the spirit of invention and the pursuit of excellence in technology.

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