The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 09, 2004
Filed:
Jul. 16, 1999
Orest Bula, Shelburne, VT (US);
Daniel C. Cole, Jericho, VT (US);
Edward W. Conrad, Jeffersonville, CT (US);
William C. Leipold, Enosburg Falls, VT (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method and structure for creating a photomask data set includes inputting a design data set, creating a simulated printed data set by applying a lithography simulation model to chosen levels of the design data set, merging each chosen level of the design data set with each corresponding level of the simulated printed data set in order to produce a merged design data set, applying at least one test to the merged design data set, correcting the design data set based on results of the test to produce a corrected design data set, repeating the creating of the simulated printed data, merging, applying the test and correcting using the corrected design data set until the corrected design data set passes the test, and outputting the corrected design data set as the photomask data set.