Daniel Bultreys

Title: The Innovative Contributions of Daniel Bultreys

Introduction

Daniel Bultreys is a notable inventor based in Brussels, Belgium. He has made significant contributions to the field of crystal structure analysis through his innovative methods and devices. His work focuses on enhancing the efficiency and accuracy of electron diffraction techniques.

Latest Patents

Daniel Bultreys holds a patent for "Methods and devices for high throughput crystal structure analysis by electron diffraction." This patent describes a method and device for electron diffraction tomography of a crystal sample. The technique involves scanning the electron beam over multiple discrete locations of the sample, utilizing a beam scanning protocol as the beam converges at each location. This process allows for the collection of a series of electron diffraction patterns, which are then analyzed using template matching to determine crystal orientations and thickness maps. This innovation aims to obtain a common intensity scaling factor, thereby improving the analysis of crystal structures.

Career Highlights

Bultreys is associated with Nanomegas Sprl, a company that specializes in advanced electron diffraction technologies. His work at Nanomegas has positioned him as a key player in the development of innovative solutions for material characterization.

Collaborations

Daniel Bultreys collaborates with talented individuals such as Stavros Nicolopoulos and Edgard Rauch. Their combined expertise contributes to the advancement of research and development in the field of electron diffraction.

Conclusion

Daniel Bultreys is a pioneering inventor whose work in electron diffraction has the potential to transform crystal structure analysis. His innovative methods and collaboration with skilled professionals highlight his commitment to advancing scientific research.