The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 28, 2012

Filed:

Nov. 06, 2009
Applicants:

Stavros Nicolopoulos, Valencia, ES;

Daniel Bultreys, Brussels, BE;

Edgard Rauch, Champagnier, FR;

Inventors:

Stavros Nicolopoulos, Valencia, ES;

Daniel Bultreys, Brussels, BE;

Edgard Rauch, Champagnier, FR;

Assignee:

NanoMegas SPRL, Molenbeek-Saint-Jean, BE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method and device for electron diffraction tomography of a crystal sample, which employs scanning of the electron beam over a plurality of discrete locations of the sample, in combination with a beam scanning protocol as the beam converges at every discrete location () of the sample () to obtain a series of electron diffraction patterns, use of template matching to determine crystal orientations and thickness maps to obtain a common intensity scaling factor.


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