Phoenix, AZ, United States of America

Daniel A Swan

This inventor holds 1 USPTO granted patent. Top assignee: Celerity, Inc.. Active years: 2008.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Daniel A Swan. Retrieved from https://idiyas.com/inventor/daniel-a-swan

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 23(Granted Patents)


Company Filing History:


Years Active: 2008

Loading Chart...
1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Daniel A. Swan

Introduction

Daniel A. Swan is a notable inventor based in Phoenix, AZ. He has made significant contributions to the field of process materials blending. His work is particularly relevant in industries requiring ultra-high purity chemicals and semiconductor manufacturing.

Latest Patents

Daniel A. Swan holds a patent for a "Method and apparatus for blending process materials." This invention focuses on a method and apparatus designed for blending and supplying process materials. It is especially applicable to the blending of ultra-high purity chemicals, abrasive slurries for polishing semiconductor wafers, and high-accuracy blending of chemicals. He has 1 patent to his name.

Career Highlights

Swan is currently employed at Celerity, Inc., where he continues to innovate and develop new solutions in his field. His expertise in blending processes has positioned him as a valuable asset to his company and the industry at large.

Collaborations

Throughout his career, Daniel has collaborated with talented individuals such as Jeffrey Alexander Wilmer and Brian Alan McAllister. These partnerships have fostered an environment of innovation and creativity.

Conclusion

Daniel A. Swan's contributions to the field of process materials blending highlight his innovative spirit and dedication to advancing technology. His work continues to impact industries that rely on precision and purity in chemical processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…