Dan Lillie

Title: The Innovative Contributions of Dan Lillie

Introduction

Dan Lillie is a notable inventor based in Garfield Heights, Ohio. He has made significant contributions to the field of technology, particularly in the area of etching solutions and manufacturing processes. With a total of five patents to his name, Lillie's work has had a considerable impact on the industry.

Latest Patents

One of Lillie's latest patents is an etching solution for forming an embedded resistor. This resistive etching solution contains thiourea, which is particularly suitable for etching an electrically resistive material comprised of a nickel-chromium alloy. The solution allows for fast and effective etching of a nickel-chromium alloy, especially in cases where the ratio of copper surface area to nickel/chromium surface area is relatively large, and where fine feature etching is desired. Another significant patent is for a process for manufacturing copper foil on a metal carrier substrate. This method involves forming a relatively thin releasable layer of copper on a carrier substrate, which includes providing a separation facilitating layer and increasing the thickness of the copper layer through electrodeposition.

Career Highlights

Throughout his career, Dan Lillie has worked with several prominent companies, including Gould Electronics Inc. and Nikko Materials USA, Inc. His experience in these organizations has contributed to his expertise and innovative capabilities in the field.

Collaborations

Lillie has collaborated with notable individuals such as Jiangtao Wang and John P. Callahan. These collaborations have likely enriched his work and led to further advancements in his inventions.

Conclusion

Dan Lillie's contributions to technology through his patents and collaborations highlight his innovative spirit and dedication to advancing the field. His work continues to influence the industry and inspire future inventors.