Cedar Park, TX, United States of America

Dan Deyo

This inventor holds 3 USPTO granted patents and 1 published patent application. Top assignee: Applied Materials, Inc.. Active years: 2017-2026.

USPTO Granted Patents = 3 

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2017-2026

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3 patents (USPTO):Explore Patents

Title: Dan Deyo - Innovator in Process Chamber Technology

Introduction

Dan Deyo is a notable inventor based in Cedar Park, TX (US). He has made significant contributions to the field of process chamber technology, holding a total of 3 patents. His work focuses on enhancing the efficiency and functionality of substrate processing systems.

Latest Patents

Deyo's latest patents include innovative designs for process chambers. One of his patents, titled "Process chambers having multiple cooling plates," describes a process chamber that features a chamber body with a view port side, a pump side, and a shutter side. This design incorporates multiple cooling plates, each equipped with coolant channels to optimize temperature control during processing. Another patent, "Substrate support chuck cooling for deposition chamber," outlines a substrate support chuck that includes an electrostatic chuck and a cooling ring assembly. This assembly is designed to improve thermal management in substrate processing chambers.

Career Highlights

Dan Deyo is currently employed at Applied Materials, Inc., a leading company in the semiconductor and display manufacturing industries. His work at Applied Materials has allowed him to develop cutting-edge technologies that enhance the performance of substrate processing systems.

Collaborations

Throughout his career, Deyo has collaborated with esteemed colleagues, including Robert Hirahara and Vijay D. Parkhe. These collaborations have contributed to the advancement of innovative technologies in the field.

Conclusion

Dan Deyo's contributions to process chamber technology demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of the complexities involved in substrate processing, making him a valuable asset to the industry.

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