Fremont, CA, United States of America

Damon Vincent Williams


Average Co-Inventor Count = 1.9

ph-index = 6

Forward Citations = 84(Granted Patents)


Company Filing History:


Years Active: 2002-2009

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12 patents (USPTO):Explore Patents

Title: **Damon Vincent Williams - Innovator in Chemical Mechanical Polishing Technologies**

Introduction

Damon Vincent Williams is a highly regarded inventor based in Fremont, California, with an impressive portfolio of 12 patents to his name. His contributions primarily center around advancements in chemical mechanical polishing (CMP) systems, which play a crucial role in the semiconductor manufacturing process. His innovative solutions address the intricacies involved in polishing wafers and related components, enhancing both precision and efficiency.

Latest Patents

Among his latest patented inventions is a **Polishing apparatus and methods having high processing workload for controlling polishing pressure applied by polishing head**. This invention implements sophisticated instructions for managing the movement of a polishing pad in relation to the wafer and a retainer ring. By carefully coordinating the feedback of the polishing pad position with desired variable forces, Damon’s technology allows for independent control over pressure applied to different areas of the wafer, ensuring optimal polishing performance.

Another significant innovation is his patent for an **Apparatus for controlling retaining ring and wafer head tilt for chemical mechanical polishing**. This CMP system innovatively measures eccentric forces applied to carriers, maintaining a precise coaxial relationship during the polishing operation. The use of a linear bearing assembly allows for accurate measurements of these forces, which is essential for achieving a coplanar relationship between the wafer surface and the retainer ring during polishing, thus optimizing overall results.

Career Highlights

Damon Vincent Williams contributes his expertise at Lam Research Corporation, a leader in semiconductor equipment and services. His innovative work not only showcases his technical skills but also highlights his commitment to advancing semiconductor manufacturing technology. Throughout his career, he has successfully secured multiple patents that signify his role as a crucial contributor to the industry.

Collaborations

Throughout his career, Damon has collaborated closely with talented colleagues, including Miguel Angel Saldana and Yehiel Gotkis. These collaborations foster an environment of innovation and creativity, leading to the development of cutting-edge solutions in the field of chemical mechanical polishing.

Conclusion

Damon Vincent Williams stands out as an influential inventor whose work in CMP systems is making significant strides in the semiconductor industry. His innovative patents and collaborations with fellow experts illustrate his dedication to improving manufacturing processes. As technology continues to advance, Damon’s contributions pave the way for future innovations that will undoubtedly enhance the efficiency and precision of semiconductor fabrication.

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