Balmain, Australia

Damon Donald Ridley

This inventor holds 55 USPTO granted patents and 9 published patent applications and 1 EPO patent, primarily in Inkjet Technology. Top assignees: Silverbrook Research Pty Ltd, Zamtec Limited, Other. Active years: 2002-2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Damon Donald Ridley. Retrieved from https://idiyas.com/inventor/damon-donald-ridley

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 55 

% Patents Active = 32.7

 

Average Co-Inventor Count = 6.0

ph-index = 9

Forward Citations = 294(Granted Patents)

Forward Citations (Not Self Cited) = 192(Dec 10, 2025)


Location History:

  • Chippendale, AU (2002)
  • Balmain, AU (2006 - 2014)

Company Filing History:


Years Active: 2002-2014

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Areas of Expertise:
Inkjet Technology
Naphthalocyanine Dyes
Solvent-Based Inks
Dye Stability
Gallium Naphthalocyanine
Phthalocyanine Dyes
Kogation Minimization
Ink Formulations
Data Entry Methods
Analog Printing
Water-Soluble Dyes
Infrared Dyes
55 patents (USPTO):Explore Patents

Title: Damon Donald Ridley - Innovative Inventor from Balmain

Introduction: Damon Donald Ridley is a renowned inventor hailing from Balmain, Australia, known for his groundbreaking contributions to various industries.

Latest Patents: Damon Donald Ridley holds several patents in the fields of renewable energy, sustainable technology, and advanced materials.

Career Highlights: With a career spanning over two decades, Damon Donald Ridley has worked tirelessly to develop cutting-edge solutions that have revolutionized the way we approach environmental challenges.

Collaborations: Throughout his career, Damon Donald Ridley has collaborated with leading research institutions, universities, and companies to bring his innovative ideas to life and make a positive impact on society.

Conclusion: Damon Donald Ridley's passion for innovation and commitment to creating a sustainable future continue to inspire the next generation of inventors and entrepreneurs.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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