Daivid SuitWai Ma

Title: Daivid SuitWai Ma: Innovator in Semiconductor Technology

Introduction

Daivid SuitWai Ma is a notable inventor based in Cary, NC (US). He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approach to memory units and testing systems.

Latest Patents

One of his latest patents is titled "Wordline gate contact for an MBIT transistor array layout." This invention involves a DRAM memory unit that contains a memory bit (mbit) transistor and a capacitive region for storing charge. The memory is designed to store data as a charge held by the capacitive region. Each memory unit is accessed through an associated wordline, and the data is read from a connected bitline. The arrangement of memory units in clusters allows for efficient access and orientation of wordlines independent of bitlines.

Another significant patent is the "Semiconductor wafer testing system." This system tests one or more die clusters on a semiconductor wafer using a test circuit to evaluate multiple sections of each die in parallel. The system includes a buffer that connects to the die cluster, enabling it to write and read test data efficiently.

Career Highlights

Throughout his career, Daivid has worked with prominent companies in the semiconductor industry, including Infineon Technologies North America Corp. and Infineon Technologies AG. His experience in these organizations has contributed to his expertise in developing advanced semiconductor technologies.

Collaborations

Daivid has collaborated with notable professionals in the field, including James J Dietz and George William Alexander. These collaborations have likely enriched his work and contributed to his innovative projects.

Conclusion

Daivid SuitWai Ma is a distinguished inventor whose work in semiconductor technology has led to valuable patents and advancements in the industry. His contributions continue to influence the development of efficient memory systems and testing methodologies.