This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Daisuke Tanaka and His Patent for a Chamber Port Assembly.
Introduction
Daisuke Tanaka is an inventor based in Los Gatos, California, and is associated with Applied Materials, Inc. His work includes an invention for connecting chambers in a substrate processing system.
Latest Patents
Tanaka is credited with 1 patent, titled “Chamber Port Assembly.” The patent describes an assembly that connects two chambers and provides a tunnel for substrates to pass between them. Its design also includes an inlet port, a manifold that directs fluid into the tunnel, and a sensor port that communicates with the tunnel.
Career Highlights
Tanaka’s patent addresses chamber connectivity and fluid delivery in substrate processing equipment. These features are intended to support substrate transfer and system monitoring.
Collaborations
Tanaka’s listed coworkers include Ralph P. Antonio and Peter Lai. The provided information does not specify their roles in the patent or their working relationship with Tanaka.
Conclusion
Daisuke Tanaka’s chamber port assembly patent reflects his contribution to substrate processing technology through a design that combines substrate passage, fluid delivery, and sensor access.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile