Location History:
- Saijyo, JP (2013)
- Saijo, JP (2019)
Company Filing History:
Years Active: 2013-2019
Title: **Daisuke Takahashi: Innovator in Polishing Technology**
Introduction
Daisuke Takahashi, a skilled inventor based in Saijyo, Japan, is known for his contributions to the field of polishing technology. With two patents to his name, Takahashi has demonstrated his innovative capabilities and commitment to enhancing product performance.
Latest Patents
Takahashi's recent patents focus on advancements in polishing pads. His first patent, titled "Polishing pad and process for producing same," introduces a polishing pad designed to achieve high flatness and reduce scratches on polished surfaces. This innovative pad features a foamed urethane sheet with specific requirements for open and closed cell ratios, ensuring excellent performance characteristics. The second patent, "Polishing pad, manufacturing method thereof and polishing method," improves the affinity of polishing liquid and stabilizes polishing performance. The urethane sheet used in this patent is crafted through a dry molding method that showcases the skilled engineering behind its design.
Career Highlights
Daisuke Takahashi has built a solid career working with notable companies, including Fujibo Holdings, Inc. and Shin-etsu Handotai Co., Ltd. His experience in these reputable organizations has allowed him to develop and refine his innovative ideas in polishing technology.
Collaborations
Throughout his career, Takahashi has collaborated with esteemed colleagues like Kohki Itoyama and Junichi Ueno. These partnerships have helped foster an environment of innovation, leading to the creation of high-quality products in the polishing sector.
Conclusion
Daisuke Takahashi's contributions to polishing technology through his patents exemplify his inventive spirit and commitment to enhancing industrial processes. His work continues to impact the refining of polishing techniques, demonstrating the importance of innovation in achieving superior product performance.