The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 01, 2013
Filed:
Jun. 22, 2010
Kohki Itoyama, Saijyo, JP;
Daisuke Takahashi, Saijyo, JP;
Junichi Ueno, Nishigo-mura, JP;
Syuichi Kobayashi, Nishigo-mura, JP;
Kohki Itoyama, Saijyo, JP;
Daisuke Takahashi, Saijyo, JP;
Junichi Ueno, Nishigo-mura, JP;
Syuichi Kobayashi, Nishigo-mura, JP;
Fujibo Holdings Inc., Chuo-Ku, Tokyo, JP;
Shin-Etsu Handotai Co., Ltd., Chiyoda-Ku, Tokyo, JP;
Abstract
A polishing pad capable of improving an affinity to polishing liquid and stabilizing polishing performance is provided. A polishing padis equipped with a urethane sheet. The urethane sheethas a polishing surface P for polishing an object to be polished. The urethane sheetis formed by a dry molding method and is formed by slicing a polyurethane foamed body which is obtained by reacting and curing mixed liquid in which an isocyanate-group containing compound, water, a foam control agent and a polyamine compound are mixed. Foamsare dispersed approximately uniformly inside the urethane sheet. Opened poreswhich are opened parts of the foamsare formed at the polishing surface P. Inside the urethane sheet, the foamsformed adjacently to each other are communicated by communication holes, and the communication holesare formed at a ratio of 800 holes/cmor more when observed from a side of the polishing surface P. Polishing liquid moves via the communication holesand the foams