Chigasaki, Japan

Daisuke Sakai

This inventor holds 2 USPTO granted patents. Top assignee: Ulvac-Phi, Incorporated. Active years: 2016-2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Daisuke Sakai. Retrieved from https://idiyas.com/inventor/daisuke-sakai-10qq26jv

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.4

ph-index = 1


Company Filing History:


Years Active: 2016-2021

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2 patents (USPTO):Explore Patents

Title: Daisuke Sakai: Innovator in Ion Beam Technology

Introduction

Daisuke Sakai is a prominent inventor based in Chigasaki, Japan. He has made significant contributions to the field of ion beam technology, holding 2 patents that showcase his innovative approach to analyzing and processing materials.

Latest Patents

Sakai's latest patents include a gas cluster ion beam apparatus and an analyzing apparatus. The analyzing apparatus features a sample chamber, a measurement apparatus, and a gas cluster ion beam apparatus. A cooling body is designed to separate the ionization chamber of the gas cluster ion beam apparatus from the nozzle support, effectively preventing heat emitted by an ionization filament from affecting the nozzle support. This design ensures that the temperature of the source gas emitted from the nozzle remains constant, while a pressure controller maintains a consistent pressure of the source gas supplied to the nozzle. This innovation allows for highly accurate depth surface profiling due to a constant sputtering rate.

His second patent involves an ion source, an ion gun, and an analysis instrument capable of performing sputtering without damaging the surface of a sample. The ion source is equipped with an emission opening that supplies ionization liquid within an electric field formed in a vacuum environment. This setup generates super large droplet cluster ions from the emission opening. When the sample is irradiated with this super large droplet cluster ion beam, the surface undergoes sputtering without damage, effectively removing contaminants or exposing a new surface. Additionally, this technology enhances detection sensitivity in mass spectroscopy.

Career Highlights

Daisuke Sakai is currently employed at Ulvac-Phi, Incorporated, where he continues to develop cutting-edge technologies in the field of ion beam applications. His work has significantly advanced the capabilities of mass spectroscopy and surface analysis.

Collaborations

Sakai collaborates with notable colleagues, including Mauo Sogou and Hiromichi Yamazui, contributing to a dynamic research environment that fosters innovation and technological advancement.

Conclusion

Daisuke Sakai's contributions to ion beam technology and his innovative patents reflect his commitment to advancing scientific research and applications. His work continues to influence the fields of material analysis and mass spectroscopy, showcasing the importance of innovation in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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