Hino, Japan

Daisuke Mori


Average Co-Inventor Count = 9.0

ph-index = 1


Company Filing History:


Years Active: 2022

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Daisuke Mori: Innovator in Gallium Nitride Semiconductor Technology

Introduction

Daisuke Mori is a prominent inventor based in Hino, Japan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative work on gallium nitride-based devices. His expertise and dedication have led to the development of a patented technology that enhances the performance of semiconductor devices.

Latest Patents

Daisuke Mori holds a patent for a gallium nitride-based semiconductor device and its manufacturing method. This invention focuses on a gallium nitride-based semiconductor device where the thickness of a transition layer is defined to be less than 1.5 nm. The patent outlines specific conditions regarding the atomic composition of nitrogen and metal elements within the semiconductor layer, which are crucial for optimizing device performance.

Career Highlights

Daisuke Mori is currently employed at Fuji Electric Co., Ltd., where he continues to advance semiconductor technology. His work has been instrumental in developing efficient and high-performance semiconductor devices that are essential for various applications in electronics.

Collaborations

Daisuke collaborates with notable colleagues, including Hideaki Matsuyama and Shinya Takashima. Their combined expertise fosters an innovative environment that drives the development of cutting-edge technologies in the semiconductor industry.

Conclusion

Daisuke Mori's contributions to gallium nitride semiconductor technology exemplify his commitment to innovation and excellence. His patented work not only enhances device performance but also positions him as a key figure in the semiconductor field.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…